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Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; Iit 2006 (AIP Conference Proceedings: Accelerators, Beams, and Instrumentations): 866

Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; Iit 2006 (AIP Conference Proceedings: Accelerators, Beams, and Instrumentations): 866

by Karen J. Kirkby,Russell M. Gwilliam,Andy Smith,David Chivers
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This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

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